- US12544958utility2026Method of Making Low Specific Gravity Polishing Pads0 cites
- US12528152utility2026CMP Pad Having Ultra Expanded Polymer Microspheres0 cites
- US12491604utility2025Chemical Mechanical Polishing Pad0 cites
- US12447581utility2025Chemical Mechanical Planarization Pad Having Polishing Layer with Multi-lobed Embedded Features0 cites
- US12447582utility2025Chemical Mechanical Polishing Pad with Fluorinated Polymer and Multimodal Groove Pattern0 cites
- US12384002utility2025Composite Pad for Chemical Mechanical Polishing0 cites
- US12330261utility2025Offset Pore Poromeric Polishing Pad0 cites
- US12275116utility2025CMP Polishing Pad with Window Having Transparency at Low Wavelengths and Material Useful in Such Window0 cites
- US12220784utility2025Chemical Mechanical Polishing Pad and Preparation Thereof0 cites
- US12064846utility2024Formulations for High Porosity Chemical Mechanical Polishing Pads with High Hardness and CMP Pads Made Therewith0 cites
- US12024652utility2024Polishing Composition and Method of Polishing a Substrate Having Enhanced Defect Reduction0 cites
- US11897082utility2024Heterogeneous Fluoropolymer Mixture Polishing Pad0 cites
- US11813713utility2023Chemical Mechanical Polishing Pad and Polishing Method0 cites
- US11806830utility2023Formulations for Chemical Mechanical Polishing Pads and CMP Pads Made Therewith0 cites
- US11772230utility2023Formulations for High Porosity Chemical Mechanical Polishing Pads with High Hardness and CMP Pads Made Therewith0 cites
- US11712777utility2023Cationic Fluoropolymer Composite Polishing Pad0 cites
- US11667061utility2023Method of Forming Leveraged Poromeric Polishing Pad0 cites
- US11638978utility2023Low-debris Fluopolymer Composite CMP Polishing Pad0 cites
Page 1 of 2Next →