Patents/Assignees

Novellus Systems, Inc.

15 patents in portfolio

US12444651utility2025
Tungsten Feature Fill with Nucleation Inhibition
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US12385138utility2025
Plasma-enhanced Deposition of Film Stacks
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US12387979utility2025
Tungsten Feature Fill with Nucleation Inhibition
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US12272547utility2025
Conformal Deposition of Silicon Carbide Films
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US12157950utility2024
Lipseals and Contact Elements for Semiconductor Electroplating Apparatuses
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US11894227utility2024
Conformal Deposition of Silicon Carbide Films
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US11746420utility2023
PECVD Apparatus for In-situ Deposition of Film Stacks
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US11732350utility2023
Films of Desired Composition and Film Properties
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US11725282utility2023
Suppression of Parasitic Deposition in a Substrate Processing System by Suppressing Precursor Flow and Plasma Outside of Substrate Region
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US11708634utility2023
Films of Desired Composition and Film Properties
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US11680314utility2023
Films of Desired Composition and Film Properties
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US11680315utility2023
Films of Desired Composition and Film Properties
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US11549192utility2023
Electroplating Apparatus for Tailored Uniformity Profile
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US11542630utility2023
Cleaning Electroplating Substrate Holders Using Reverse Current Deplating
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US8343318utility2013
Magnetic Lensing to Improve Deposition Uniformity in a Physical Vapor Deposition (PVD) Process
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