- US12360063utility2025System and Method for Measuring a Sample by X-ray Reflectance Scatterometry0 cites
- US12281893utility2025Characterizing and Measuring in Small Boxes Using XPS with Multiple Measurements0 cites
- US12165863utility2024Systems and Approaches for Semiconductor Metrology and Surface Analysis Using Secondary Ion Mass Spectrometry0 cites
- US12158437utility2024XPS Metrology for Process Control in Selective Deposition0 cites
- US12066391utility2024Method and System for Non-destructive Metrology of Thin Layers0 cites
- US11996259utility2024Patterned X-ray Emitting Target0 cites
- US11988502utility2024Characterizing and Measuring in Small Boxes Using XPS with Multiple Measurements0 cites
- US11874237utility2024System and Method for Measuring a Sample by X-ray Reflectance Scatterometry0 cites
- US11852467utility2023Method and System for Monitoring Deposition Process0 cites
- US11823883utility2023Mass Spectrometer Detector and System and Method Using the Same0 cites
- US11764050utility2023Systems and Approaches for Semiconductor Metrology and Surface Analysis Using Secondary Ion Mass Spectrometry0 cites
- US11733035utility2023Feed-forward of Multi-layer and Multi-process Information Using XPS and XRF Technologies0 cites
- US11680915utility2023XPS Metrology for Process Control in Selective Deposition0 cites
- US11668663utility2023Method and System for Non-destructive Metrology of Thin Layers0 cites