- US12610766utility2026Method of Patterning a Semiconductor Structure0 cites
- US12610534utility2026Memory Device with Air Gap and Method for Preparing the Same0 cites
- US12610765utility2026Manufacturing Method of Semiconductor Device0 cites
- US12610787utility2026Asymmetric Pads Structure and Test Element Group Module0 cites
- US12610795utility2026Method for Patterning Active Areas in Semiconductor Structure0 cites
- US12610568utility2026Semiconductor Device with Electrode Having Step-shaped Sidewall and Method for Preparing the Same0 cites
- US12610519utility2026Semiconductor Structure and Manufacturing Method Thereof0 cites
- US12610843utility2026Semiconductor Structure Having Dummy Conductive Member and Manufacturing Method Thereof0 cites
- US12610805utility2026Semiconductor Device with Polymer Liner and Method for Fabricating the Same0 cites
- US12610602utility2026Semiconductor Device and Manufacture Method0 cites
- US12610803utility2026Semiconductor Device Structure with Reduced Critical Dimension and Method for Preparing the Same0 cites
- US12604461utility2026Dynamic Random Access Memory0 cites
- US12604462utility2026Semiconductor Structure Having Word Line and Manufacturing Method Thereof0 cites
- US12604463utility2026Memory Device Having Ultra-lightly Doped Region and Manufacturing Method Thereof0 cites
- US12604466utility2026Semiconductor Device and Manufacturing Method Thereof0 cites
- US12604490utility2026Memory Device Having a Container-shaped Electrode and Method for Fabricating the Same0 cites
- US12604514utility2026Semiconductor Device with Recessed Gate and Method for Fabricating the Same0 cites
- US12604689utility2026Bracing Structure, Semiconductor Device with the Same, and Method for Fabricating the Same0 cites