Patents/Assignees

Lam Research Corporation

562 patents in portfolio

US11674226utility2023
Separation of Plasma Suppression and Wafer Edge to Improve Edge Film Thickness Uniformity
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US11676798utility2023
Cooling for a Plasma-based Reactor
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US11670516utility2023
Metal-containing Passivation for High Aspect Ratio Etch
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US11670503utility2023
Method of Atomic Layer Deposition
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US11670486utility2023
Pulsed Plasma Chamber in Dual Chamber Configuration
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US11670535utility2023
Carrier Plate for Use in Plasma Processing Systems
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US11662237utility2023
MEMS Coriolis Gas Flow Controller
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US11661654utility2023
Substrate Processing Systems Including Gas Delivery System with Reduced Dead Legs
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US11664262utility2023
Electrostatic Chucks with Coolant Gas Zones and Corresponding Groove and Monopolar Electrostatic Clamping Electrode Patterns
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US11655535utility2023
Device for Pulsed Laser Deposition and a Substrate with a Substrate Surface for Reduction of Particles on the Substrate
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USD0986825design2023
Connector Backshell
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US11655556utility2023
Flow Assisted Dynamic Seal for High-convection, Continuous-rotation Plating
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US11651991utility2023
Electrostatic Chuck Design for Cooling-gas Light-up Prevention
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US11651963utility2023
Method of Improving Deposition Induced CD Imbalance Using Spatially Selective Ashing of Carbon Based Film
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US11646207utility2023
Silicon Oxide Silicon Nitride Stack Stair Step Etch
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US11646198utility2023
Ultrathin Atomic Layer Deposition Film Accuracy Thickness Control
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US11634817utility2023
Substrate Pedestal Including Backside Gas-delivery Tube
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US11637022utility2023
Electron Excitation Atomic Layer Etch
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US11637037utility2023
Method to Create Air Gaps
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US11628389utility2023
Filter for a Plasma Plume
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