Patents/Assignees

KOJUNDO CHEMICAL LABORATORY CO., Ltd.

6 patents in portfolio

US12571099utility2026
Bis(ethylcyclopentadienyl)tin, Precursor for Chemical Vapor Deposition, Method of Producing Tin-containing Thin Film, and Method of Producing Tin Oxide Thin Film
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US12410514utility2025
Vapor Deposition Source Material Used in Production of Film Containing Indium and One or More of the Other Metals, and the Method of Producing Film Containing Indium and One or More of the Other Metals
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US11807939utility2023
Atomic Layer Deposition Method for Metal Thin Films
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US11655538utility2023
Precursor for Chemical Vapor Deposition, and Light-blocking Container Containing Precursor for Chemical Vapor Deposition and Method for Producing the Same
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US11613809utility2023
Solid Vaporization/supply System of Metal Halide for Thin Film Deposition
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US11566326utility2023
Vaporizable Source Material Container and Solid Vaporization/supply System Using the Same
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