- US12131959utility2024Systems and Methods for Improved Metrology for Semiconductor Device Wafers0 cites
- US12133318utility2024Rotating Target for Extreme Ultraviolet Source with Liquid Metal0 cites
- US12117347utility2024Metrology Target Design for Tilted Device Designs0 cites
- US12111580utility2024Optical Metrology Utilizing Short-wave Infrared Wavelengths0 cites
- US12105136utility2024Method for Determining Material Parameters of a Multilayer Test Sample0 cites
- US12105414utility2024Targets for Diffraction-based Overlay Error Metrology0 cites
- US12105431utility2024Annular Apodizer for Small Target Overlay Measurement0 cites
- US12105433utility2024Imaging Overlay Targets Using Moiré Elements and Rotational Symmetry Arrangements0 cites
- US12100132utility2024Laser Anneal Pattern Suppression0 cites
- US12100574utility2024Target and Algorithm to Measure Overlay by Modeling Back Scattering Electrons on Overlapping Structures0 cites
- US12092183utility2024Spring Mechanism for Self-lock and Centering During Loading0 cites
- US12092814utility2024Correcting Aberration and Apodization of an Optical System Using Correction Plates0 cites
- US12092966utility2024Device Feature Specific Edge Placement Error (EPE)0 cites
- US12094100utility2024Measurement of Stitching Error Using Split Targets0 cites
- US12085385utility2024Design-assisted Large Field of View Metrology0 cites
- US12078601utility2024Universal Metrology Model0 cites
- US12080610utility2024Wavelet System and Method for Ameliorating Misregistration and Asymmetry of Semiconductor Devices0 cites
- US12072606utility2024Protective Coating for Nonlinear Optical Crystal0 cites
- US12066322utility2024Single Grab Overlay Measurement of Tall Targets0 cites