Patents/Assignees

FUJIMI INCORPORATED

51 patents in portfolio

US12258492utility2025
Polishing Composition, Polishing Method, and Method for Manufacturing Substrate
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US12249513utility2025
Surface Treatment Method, Method for Producing Semiconductor Substrate Including the Surface Treatment Method, Composition for Surface Treatment, and System for Producing Semiconductor Substrate Including the Composition for Surface Treatment
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US12221557utility2025
Polishing Composition and Polishing Method
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US12208446utility2025
Powder Material for Use in Additive Layer Manufacturing, Additive Layer Manufacturing Method Using Same, and Molded Article
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US12146077utility2024
Polishing Composition
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US12139643utility2024
Polishing Composition
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US12110422utility2024
Polishing Method and Polishing Composition
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US12077680utility2024
Polishing Composition, Production Method of the Same, Polishing Method and a Manufacturing Method of a Semiconductor Substrate
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US12031015utility2024
Quaternary Ammonium-based Surface Modified Silica, Compositions, Methods of Making, and Methods of Use Thereof
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US12012337utility2024
Method for Producing Porous Metal Oxide
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US12012575utility2024
Composition for Surface Treatment, Method for Producing the Same, Surface Treatment Method, and Method for Producing Semiconductor Substrate
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US11999877utility2024
Silicon Nitride Chemical Mechanical Polishing Slurry with Silicon Nitride Removal Rate Enhancers and Methods of Use Thereof
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US11992914utility2024
Polishing Composition, Polishing Method, and Method for Producing Substrate
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US11976220utility2024
Polishing Composition and Method for Producing Same
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US11939491utility2024
Method of Polishing Object to Be Polished Containing Material Having Silicon-silicon Bond
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US11897081utility2024
Method for Polishing Silicon Substrate and Polishing Composition Set
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US11884843utility2024
Polishing Composition, Polishing Method, and Method of Producing Semiconductor Substrate
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US11851638utility2023
Surface Treatment Composition, Method for Producing Surface Treatment Composition, Surface Treatment Method, and Method for Producing Semiconductor Substrate
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US11814294utility2023
Method of Producing Anionically Modified Colloidal Silica
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US11781039utility2023
Polishing Composition and Polishing Method
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