- US11851584utility2023Alternative Oxidizing Agents for Cobalt CMP0 cites
- US11855258utility2023Secondary Battery Cell with Solid Polymer Electrolyte0 cites
- US11845157utility2023Chemical Mechanical Planarization Pads via Vat-based Production0 cites
- US11845156utility2023Polishing Pad Employing Polyamine and Cyclohexanedimethanol Curatives0 cites
- US11807710utility2023Uv-curable Resins Used for Chemical Mechanical Polishing Pads0 cites
- US11802220utility2023Silica-based Slurry for Selective Polishing of Carbon-based Films0 cites
- US11725116utility2023CMP Composition Including a Novel Abrasive0 cites
- US11637317utility2023Solid Polymer Electrolyte Compositions and Methods of Preparing Same0 cites
- US11629271utility2023Titanium Dioxide Containing Ruthenium Chemical Mechanical Polishing Slurry0 cites
- US11597854utility2023Method to Increase Barrier Film Removal Rate in Bulk Tungsten Slurry0 cites