Patents/Assignees

ASML Netherlands B.V.

728 patents in portfolio

US12610629utility2026
Charged-particle Detector Package for High Speed Applications
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US12610781utility2026
Base Plate and Substrate Assembly
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US12601978utility2026
Method of Setting Up a Projection Exposure System, a Projection Exposure Method and a Projection Exposure System for Microlithography
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US12601984utility2026
Metrology Method and Apparatus
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US12603595utility2026
Electromagnetic Motor System, Position Control System, Stage Apparatus, Lithographic Apparatus, Method of Determining a Motor-dependent Commutation Model for an Electromagnetic Motor
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US12596308utility2026
Modular Wafer Table and Methods of Manufacturing Thereof
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US12597102utility2026
Image Enhancement in Charged Particle Inspection
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US12591179utility2026
Metrology Apparatus
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US12591178utility2026
Method for Adjusting a Patterning Process
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US12591184utility2026
Enhanced Alignment for a Photolithographic Apparatus
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US12591183utility2026
Sensor Positioning Method, a Positioning System, a Lithographic Apparatus, a Metrology Apparatus, and a Device Manufacturing Method
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US12591177utility2026
Method for Obtaining Training Data for Training a Model of a Semiconductor Manufacturing Process
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US12585049utility2026
Achromatic Optical Relay Arrangement
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US12585196utility2026
Method and Apparatus for Controlling a Computing Process
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US12585201utility2026
Metrology Mark Structure and Method of Determining Metrology Mark Structure
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US12586753utility2026
Image Enhancement Based on Charge Accumulation Reduction in Charged-particle Beam Inspection
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US12586170utility2026
System and Method for Generating Predictive Images for Wafer Inspection Using Machine Learning
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US12578653utility2026
Method for Determining a Sampling Scheme, a Semiconductor Substrate Measurement Apparatus, a Lithographic Apparatus
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US12578655utility2026
Sub-field Control of a Lithographic Process and Associated Apparatus
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US12578658utility2026
Systems, Methods, and Devices for Thermal Conditioning of Reticles in Lithographic Apparatuses
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