Patents/Assignees

ASML Netherlands B.V.

728 patents in portfolio

US12339583utility2025
Optimization Using a Non-uniform Illumination Intensity Profile
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US12339594utility2025
Substrate Level Sensing in a Lithographic Apparatus
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US12332573utility2025
Method for Determining Defectiveness of Pattern Based on After Development Image
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US12332541utility2025
Method for Generating Broadband Radiation and Associated Broadband Source and Metrology Device
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US12332570utility2025
Lithographic System Provided with a Deflection Apparatus for Changing a Trajectory of Particulate Debris
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US12325911utility2025
Method and Apparatus for Forming a Patterned Layer of Material
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US12326407utility2025
Inspection Apparatus and Inspection Method
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US12326428utility2025
Residual Gas Analyzer
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US12327707utility2025
Charged Particle Blocking Element, Exposure Apparatus Comprising Such an Element, and Method for Using Such an Exposure Apparatus
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US12326669utility2025
Illumination Apparatus and Associated Metrology and Lithographic Apparatuses
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US12321101utility2025
Method for Applying a Deposition Model in a Semiconductor Manufacturing Process
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US12322569utility2025
Method and System for Fabricating Unique Chips Using a Charged Particle Multi-beamlet Lithography System
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US12322660utility2025
Method and Apparatus to Determine a Patterning Process Parameter
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US12324084utility2025
Apparatus for and Method of Controlling Droplet Generator Performance
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US12315175utility2025
Method in the Manufacturing Process of a Device, a Non-transitory Computer-readable Medium and a System Configured to Perform the Method
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US12315756utility2025
Method of Manufacturing a Substrate Support for a Lithographic Apparatus, Substrate Table, Lithographic Apparatus, Device Manufacturing Method, Method of Use
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US12313980utility2025
Inspection System, Lithographic Apparatus, and Inspection Method
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US12306433utility2025
Hollow-core Photonic Crystal Fiber Based Optical Component for Broadband Radiation Generation
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US12305979utility2025
Interferometer System and Lithographic Apparatus
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US12306545utility2025
Determining Lithographic Matching Performance
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