- US12394659utility2025Susceptors with Film Deposition Control Features0 cites
- US12385131utility2025Method of Forming a Structure Including a Silicon Carbide Layer0 cites
- US12381077utility2025Methods of Filling Recesses on Substrate Surfaces and Forming Voids Therein0 cites
- US12381087utility2025Methods for Filling a Gap and Related Systems and Devices0 cites
- US12378665utility2025High Temperature Coatings for a Preclean and Etch Apparatus and Related Methods0 cites
- US12378667utility2025Methods and Systems for Forming Doped Silicon Nitride Films0 cites
- US12365984utility2025Transition Metal Deposition Processes and Deposition Assembly0 cites
- US12366410utility2025Apparatus for Processing a Plurality of Substrates Provided with an Extractor Chamber0 cites
- US12365988utility2025Atomic Layer Deposition and Etching of Transition Metal Dichalcogenide Thin Films0 cites
- US12365983utility2025Methods for Forming a Boron Nitride Film by a Plasma Enhanced Atomic Layer Deposition Process0 cites
- US12365981utility2025Synthesis and Use of Precursors for ALD of Molybdenum or Tungsten Containing Thin Films0 cites
- US12362171utility2025Methods and Systems for Forming a Layer Comprising Aluminum, Titanium, and Carbon0 cites
- US12362174utility2025Method and Wafer Processing Furnace for Forming an Epitaxial Stack on a Plurality of Substrates0 cites
- US12363960utility2025Method for Depositing a Group IV Semiconductor and Related Semiconductor Device Structures0 cites
- US12359312utility2025Method and System for Forming a Silicon Oxycarbide Layer and Structure Formed Using Same0 cites
- US12359315utility2025Deposition of Oxides and Nitrides0 cites
- US12354877utility2025Vapor Deposition of Films Comprising Molybdenum0 cites
- US12354893utility2025Fixture and Method for Determining Position of a Target in a Reaction Chamber0 cites