Patents/Assignees

ASM IP Holding B.V.

539 patents in portfolio

US11814715utility2023
Cyclic Deposition Methods for Forming Metal-containing Material and Films and Structures Including the Metal-containing Material
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US11814728utility2023
Method for Filling a Gap in a Three-dimensional Structure on a Semiconductor Substrate
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US11814747utility2023
Gas-phase Reactor System-with a Reaction Chamber, a Solid Precursor Source Vessel, a Gas Distribution System, and a Flange Assembly
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US11814727utility2023
Systems and Methods for Atomic Layer Deposition
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US11810788utility2023
Methods for Forming a Transition Metal Niobium Nitride Film on a Substrate by Atomic Layer Deposition and Related Semiconductor Device Structures
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US11802338utility2023
Chemical Treatment, Deposition And/or Infiltration Apparatus and Method for Using the Same
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US11804373utility2023
Selective Layer Formation Using Deposition and Removing
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US11804364utility2023
Substrate Processing Apparatus
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US11804388utility2023
Substrate Processing Apparatus and Method
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US11795545utility2023
Multiple Temperature Range Susceptor, Assembly, Reactor and System Including the Susceptor, and Methods of Using the Same
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US11798999utility2023
Methods for Forming a Metal Silicate Film on a Substrate in a Reaction Chamber and Related Semiconductor Device Structures
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US11798834utility2023
Cyclical Deposition Method and Apparatus for Filling a Recess Formed Within a Substrate Surface
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US11798830utility2023
Fast FOUP Swapping with a FOUP Handler
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US11788190utility2023
Liquid Vaporizer
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US11791153utility2023
Deposition of Hafnium Oxide Within a High Aspect Ratio Hole
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US11784043utility2023
Formation of Sin Thin Films
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US11781221utility2023
Chemical Source Vessel with Dip Tube
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US11781243utility2023
Method for Depositing Low Temperature Phosphorous-doped Silicon
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US11776807utility2023
Plasma Enhanced Deposition Processes for Controlled Formation of Oxygen Containing Thin Films
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US11776846utility2023
Methods for Depositing Gap Filling Fluids and Related Systems and Devices
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