- US11915917utility2024Methods and Apparatus for Reducing Sputtering of a Grounded Shield in a Process Chamber0 cites
- US11915918utility2024Cleaning of Sin with CCP Plasma or RPS Clean0 cites
- US11914299utility2024Lithography Process Window Enhancement for Photoresist Patterning0 cites
- US11915932utility2024Plasma Etching of Mask Materials0 cites
- US11915940utility2024Method of Depositing a Pre-etch Protective Layer0 cites
- US11914305utility2024Data Inspection for Digital Lithography for HVM Using Offline and Inline Approach0 cites
- US11915950utility2024Multi-zone Semiconductor Substrate Supports0 cites
- US11915953utility2024Apparatus, Systems, and Methods of Measuring Edge Ring Distance for Thermal Processing Chambers0 cites
- US11911870utility2024Polishing Pads for High Temperature Processing0 cites
- US11913777utility2024Detector for Process Kit Ring Wear0 cites
- US11913776utility2024Interference In-sensitive Littrow System for Optical Device Structure Measurement0 cites
- US11913563utility2024Temperature Actuated Valve and Methods of Use Thereof0 cites
- US11913107utility2024Methods and Apparatus for Processing a Substrate0 cites
- US11911869utility2024Chemical Mechanical Polishing System with Platen Temperature Control0 cites
- US11914406utility2024Self-sensing and Self-actuating Valve for Modulating Process Coolant Flow0 cites
- US11915850utility2024Two Channel Cosine-theta Coil Assembly0 cites
- US11908662utility2024Device and Method for Tuning Plasma Distribution Using Phase Control0 cites
- US11904429utility2024Substrate Polishing Apparatus with Contact Extension or Adjustable Stop0 cites
- US11905583utility2024Gas Quench for Diffusion Bonding0 cites