Patents/Assignees

Applied Materials, Inc.

2,863 patents in portfolio

US12007610utility2024
Waveguide Combiners Having a Pass-through In-coupler Grating
0 cites
US12007686utility2024
Etch Processing System Having Reflective Endpoint Detection
0 cites
US12009178utility2024
Ceramic Coated Quartz Lid for Processing Chamber
0 cites
US12009185utility2024
Semiconductor Processing Apparatus Having Improved Temperature Control
0 cites
US12009191utility2024
Thin Film, In-situ Measurement Through Transparent Crystal and Transparent Substrate Within Processing Chamber Wall
0 cites
US12009218utility2024
Pulsed Etch Process
0 cites
US12009228utility2024
Low Temperature Chuck for Plasma Processing Systems
0 cites
US12009235utility2024
In-chamber Low-profile Sensor Assembly
0 cites
US12009237utility2024
Sequencer Time Leaping Execution
0 cites
US12009244utility2024
Tunable Temperature Controlled Substrate Support Assembly
0 cites
US12003841utility2024
Edge Inspection System for Inspection of Optical Devices
0 cites
US12000044utility2024
Catalyzed Deposition of Metal Films
0 cites
US12000041utility2024
Processing Chamber Condition and Process State Monitoring Using Optical Reflector Attached to Processing Chamber Liner
0 cites
US12000048utility2024
Pedestal for Substrate Processing Chambers
0 cites
US12001193utility2024
Apparatus for Environmental Control of Dies and Substrates for Hybrid Bonding
0 cites
US12001197utility2024
Eco-efficiency (sustainability) Dashboard for Semiconductor Manufacturing
0 cites
US12002649utility2024
Spinning Disk with Electrostatic Clamped Platens for Ion Implantation
0 cites
US12002657utility2024
Multi-layer Plasma Resistant Coating by Atomic Layer Deposition
0 cites
US12002654utility2024
Modular High-frequency Source
0 cites
US12002659utility2024
Apparatus for Generating Etchants for Remote Plasma Processes
0 cites

← PreviousPage 77 of 144Next →