- US12262559utility2025Monolithic Complementary Field-effect Transistors Having Carbon-doped Release Layers0 cites
- US12261062utility2025Spot Heating by Moving a Beam with Horizontal Rotary Motion0 cites
- US12261226utility2025Transistor Devices with Multi-layer Interlayer Dielectric Structures0 cites
- US12261047utility2025Doping Techniques0 cites
- US12261049utility2025Selective Etch of a Substrate0 cites
- US12261039utility2025Method of Linearized Film Oxidation Growth0 cites
- US12261019utility2025Voltage Pulse Time-domain Multiplexing0 cites
- US12259719utility2025Methods and Mechanisms for Preventing Fluctuation in Machine-learning Model Performance0 cites
- US12257665utility2025Machine Vision as Input to a CMP Process Control Algorithm0 cites
- US12257664utility2025Controlling Chemical Mechanical Polishing Pad Stiffness by Adjusting Wetting in the Backing Layer0 cites
- US12257592utility2025Showerhead with Embedded Nut0 cites
- US12255089utility2025Robot Apparatus, Systems, and Methods for Transporting Substrates in Electronic Device Manufacturing0 cites
- US12251787utility2025Modular Chemical Mechanical Polisher with Simultaneous Polishing and Pad Treatment0 cites
- US12255067utility2025Method for Depositing Layers Directly Adjacent Uncovered Vias or Contact Holes0 cites
- US12255055utility2025Integrated Cleaning Process for Substrate Etching0 cites
- US12255054utility2025Methods to Eliminate of Deposition on Wafer Bevel and Backside0 cites
- US12255051utility2025Multi-shape Voltage Pulse Trains for Uniformity and Etch Profile Tuning0 cites
- US12253476utility2025Multi-level RF Pulse Monitoring and RF Pulsing Parameter Optimization at a Manufacturing System0 cites
- US12252779utility2025Methods for In-situ Chamber Monitoring0 cites
- US12251830utility2025Substrate Transfer Devices, Systems and Methods of Use Thereof0 cites