- US12317758utility2025SNSPD with Integrated Aluminum Nitride Seed or Waveguide Layer0 cites
- US12314043utility2025Bayesian Decomposition for Mismatched Performances in Semiconductor Equipment0 cites
- US12317543utility2025Moisture Barrier Film Having Low Refraction Index and Low Water Vapor Transmission Rate0 cites
- US12317493utility2025Methods of Forming 3D NAND Structures with Decreased Pitch0 cites
- US12315747utility2025Workpiece Handling Architecture for High Workpiece Throughput0 cites
- US12315746utility2025Bottom Cover Plate to Reduce Wafer Planar Nonuniformity0 cites
- US12315748utility2025Workpiece Handling Architecture for High Workpiece Throughput0 cites
- US12315736utility2025Methods of Highly Selective Silicon Oxide Removal0 cites
- US12315732utility2025Method and Apparatus for Etching a Semiconductor Substrate in a Plasma Etch Chamber0 cites
- US12315745utility2025Heater Cover Plate for Uniformity Improvement0 cites
- US12315724utility2025Helium-free Silicon Formation0 cites
- US12315718utility2025Forming Films with Improved Film Quality0 cites
- US12314340utility2025Anomaly Detection from Aggregate Statistics Using Neural Networks0 cites
- US12313838utility2025Reflective Display Devices and Components0 cites
- US12313180utility2025Gas Flow Valve and Methods of Operating Thereof0 cites
- US12312702utility2025Plating Systems Having Reduced Air Entrainment0 cites
- US12312689utility2025Large-area High-density Plasma Processing Chamber for Flat Panel Displays0 cites
- US12311494utility2025Pressure Signals During Motor Torque Monitoring to Provide Spatial Resolution0 cites
- US12308272utility2025High Throughput Polishing Modules and Modular Polishing Systems0 cites
- US12308218utility2025Thermal Shield for Processing Chamber0 cites