- US11574825utility2023External Substrate System Rotation in a Semiconductor Processing System0 cites
- US11574796utility2023Dual XY Variable Aperture in an Ion Implantation System0 cites
- US11573452utility2023Method for Lcos DBR Multilayer Stack Protection via Sacrificial Hardmask for RIE and CMP Processes0 cites
- US11572622utility2023Systems and Methods for Cleaning Low-k Deposition Chambers0 cites
- US11572619utility2023Method of Thin Film Deposition in Trenches0 cites
- US11572618utility2023Method and Chamber for Backside Physical Vapor Deposition0 cites
- US11572617utility2023Protective Metal Oxy-fluoride Coatings0 cites
- US11571786utility2023Consumable Part Monitoring in Chemical Mechanical Polisher0 cites
- USD0977504design2023Portion of a Display Panel with a Graphical User Interface0 cites
- US11565489utility2023Wetting Layers for Optical Device Enhancement0 cites
- US11565402utility2023Substrate Transfer Devices, Systems and Methods of Use Thereof0 cites
- US11565367utility2023Retaining Ring0 cites
- US11569122utility2023Methods and Apparatus for Cleaving of Semiconductor Substrates0 cites
- US11569242utility2023DRAM Memory Device Having Angled Structures with Sidewalls Extending Over Bitlines0 cites
- US11569245utility2023Growth of Thin Oxide Layer with Amorphous Silicon and Oxidation0 cites
- US11569257utility2023Multi-layer Stacks for 3D NAND Extendability0 cites
- US11570879utility2023Methods and Apparatus for Controlling RF Parameters at Multiple Frequencies0 cites
- US11569114utility2023Semiconductor Processing with Cooled Electrostatic Chuck0 cites
- US11569102utility2023Oxidation Inhibiting Gas in a Manufacturing System0 cites
- US11569095utility2023Techniques and Apparatus for Selective Shaping of Mask Features Using Angled Beams0 cites