Patents/Assignees

American Air Liquide, Inc.

17 patents in portfolio

US12467134utility2025
Method for Deposition of Gallium-containing Film with Gallium Precursors
0 cites
US12435096utility2025
Indium Precursors for Vapor Depositions
0 cites
US12366415utility2025
Heat Exchanger and Use Thereof
0 cites
US12341017utility2025
Etching Methods with Alternating Non-plasma and Plasma Etching Processes
0 cites
US12327732utility2025
Method to Improve Profile Control During Selective Etching of Silicon Nitride Spacers
0 cites
US12312264utility2025
Method for Mixing Gas-free Liquid Oxidant with Process Liquid
0 cites
US12224177utility2025
Method of Running an Etch Process in Higher Selectivity to Mask and Polymer Regime by Using a Cyclic Etch Process
0 cites
US12187853utility2025
Silicon-based Self-assembling Monolayer Compositions and Surface Preparation Using the Same
0 cites
US12188123utility2025
Deposition of Iodine-containing Carbon Films
0 cites
US12106971utility2024
High Conductive Passivation Layers and Method of Forming the Same During High Aspect Ratio Plasma Etching
0 cites
US12083493utility2024
Selective Adsorption of Halocarbon Impurities Containing Cl, Br and I in Fluorocarbons or Hydrofluorocarbons Using Adsorbent Supported Metal Oxide
0 cites
US11837474utility2023
Method to Improve Profile Control During Selective Etching of Silicon Nitride Spacers
0 cites
US11806677utility2023
Preprocessing Method for Solid Material, and Solid Material Product Filled with Solid Material Manufactured Using Said Solid Material Preprocessing Method
0 cites
US11798811utility2023
Iodine-containing Fluorocarbon and Hydrofluorocarbon Compounds for Etching Semiconductor Structures
0 cites
US11784041utility2023
Preparation of Lanthanide-containing Precursors and Deposition of Lanthanide-containing Films
0 cites
US11739220utility2023
Perhydropolysilazane Compositions and Methods for Forming Oxide Films Using Same
0 cites
US8343860utility2013
High C Content Molecules for C Implant
0 cites