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Patents/USD1102161

Fabric with Pattern

USD1102161No. D 1,102,161designGranted 11/18/2025

Claims (1)

Claim 1 (Independent)

The ornamental design for a fabric with pattern, as shown and described.

Full Description

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FIG. 1 is a top plan view of a fabric with pattern according to a first embodiment of the design; and,

FIG. 2 is a top plan view of a fabric with pattern according to a second embodiment of the design.

The dot-dash broken line perimeter surrounding the fabric with pattern in FIGS. 1 and 2 is for illustrating the boundaries of the claimed design only and does not form part of the claimed design.

Citations

This patent cites (26)

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