Claims (1)
Claim 1 (Independent)
The ornamental design for a hat form, as shown and described.
Full Description
Show full text →
FIG. 1 is a front, left, bottom isometric view of the hat form;
FIG. 2 is a front elevation view of the hat form, the rear elevation view being a mirror image of the front elevation view;
FIG. 3 is a left side elevation view of the hat form, the right side elevation view being a mirror image of the left side elevation view;
FIG. 4 is a top plan view of the hat form; and,
FIG. 5 is a bottom plan view of the hat form.
The shade lines in the figures show contour and not surface ornamentation. The broken lines in the figures show claimed stitching.
Citations
This patent cites (19)
- US1062062
- US1839940
- US1845076
- US1997330
- US2045231
- US2450521
- US4113154
- US5148954
- US5725134
- US6648189
- US7980433
- US8191742
- US8776273
- USD812861
- USD844252
- USD918538
- USD919241
- USD985240
- US20060049220