Electrostatic Chuck for Semiconductor Manufacture

1. Electrostatic chuck for semiconductor manufacture

FIG. 1 . 1 is a front perspective view of an electrostatic chuck for semiconductor manufacture showing my new design;

FIG. 1 . 2 is another front perspective view thereof;

FIG. 1 . 3 is a front elevation view thereof;

FIG. 1 . 4 is a top plan view thereof;

FIG. 1 . 5 is a bottom plan view thereof;

FIG. 1 . 6 is a left side elevation view thereof;

FIG. 1 . 7 is a right side elevation view thereof;

FIG. 1 . 8 is an enlarged portion view labeled, “Fig. 1 . 8 ” in Fig. 1 . 1 ; and

FIG. 1 . 9 is an enlarged portion view labeled, “Fig. 1 . 9 ” in Fig. 1 . 2 .

The dashed-dot lines in Figs. 1 . 1 , 1 . 2 , 1 . 8 and 1 . 9 denote the boundaries of the enlarged portion views shown in Figs. 1 . 8 and 1 . 9 and form no part of the claimed design.