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Patents/USD0979524

Confinement Liner for a Substrate Processing Chamber

USD0979524No. D 979,524designGranted 2/28/2023

Claims (1)

Claim 1 (Independent)

The ornamental design for a confinement liner for a substrate processing chamber, as shown and described.

Full Description

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FIG. 1 is a top isometric view of a confinement liner for a substrate processing chamber showing my new design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a front elevation view thereof;

FIG. 5 is a rear elevation view thereof;

FIG. 6 is a left side elevation view thereof;

FIG. 7 is a right side elevation view thereof; and,

FIG. 8 is an enlarged cross sectional view taken along line 8 - 8 of FIG. 2 .

The broken lines shown in the drawings represent portions of a confinement liner for a substrate processing chamber that form no part of the claimed design.

Citations

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