Image Sensor Including Meta Pattern Layer Having Light Resonance Function

CROSS-REFERENCE TO RELATED APPLICATION

This application is based on and claims priority under 35 U.S.C. Korean Patent Application No. 10-2021-0101018, filed on Jul. 30, 2021, in the Korean Intellectual Property Office, the disclosure of which is herein incorporated by reference in its entirety.

BACKGROUND

1. Field

The disclosure relates to an image sensor, and more particularly, to an image sensor including a meta pattern layer having a light resonance function.

2. Description of the Related Art

An image sensor generally includes a microlens array for collecting light, a planarized layer, an organic color filter for color filtering, and a photodiode. The microlens array and the organic color filter are independently provided. The microlens array and the organic color filter are provided as individual layers for collecting and color filtering, respectively, and a light path needs to be secured.

SUMMARY

One or more example embodiments provide an image sensor having a simplified configuration.

One or more example embodiments provide an image sensor that is stable and has an improved degree of integration.

Additional aspects will be set forth in part in the description which follows and, in part, will be apparent from the description, or may be learned by practice of the presented embodiments of the disclosure.

According to an aspect of an example embodiment, provided is an image sensor including: a photoelectric conversion layer; an interlayer material layer on the photoelectric conversion layer; and a single meta pattern layer on the interlayer material layer, wherein the meta pattern layer includes a metasurface, the metasurface having a same phase profile as that of a lens, and the meta pattern layer has a height that causes a resonance at a given wavelength of incident light to block transmission of the given wavelength through the meta pattern layer.

The metasurface may include a plurality of meta patterns, each having a shape of a concentric circle or a shape similar to the concentric circle.

The plurality of meta patterns may have a same height as each other.

At least two meta patterns of the plurality of meta patterns may contact each other in a diagonal direction.

A meta pattern at a center of the plurality of meta patterns may have a rectangular planar shape.

Each of the plurality of meta patterns may include a plurality of unit meta patterns.

Each of the plurality of unit meta patterns may be a nanorod and have a circular shape or a non-circular planar shape.

The nanorod may be a single-walled cylinder or a double-walled cylinder.

The plurality of meta patterns may be respectively arranged in concentric circles, separated from each other, and have different heights from each other.

A meta pattern at a center of the concentric circle among the plurality of meta patterns may be circular and have a height that causes the resonance.

The heights of the plurality of meta patterns may decrease from a center toward an outside of the concentric circle.

Among the plurality of meta patterns, a height of a meta pattern at a center of the concentric circle may be less than a height of an adjacent meta pattern.

The plurality of meta patterns may be arranged such that a height of a meta pattern at a center of the concentric circle and a height of a meta pattern at an outermost side are different from each other.

The plurality of meta patterns may be arranged at distances that cause the resonance at a corresponding wavelength in a radial direction.

The plurality of meta patterns may be arranged such that a distance between a meta pattern located at an outermost side and a meta pattern adjacent thereto is greatest among the distances between the plurality of meta patterns.

Each of the plurality of meta patterns may have a thickness that causes the resonance at a corresponding wavelength in a radial direction.

A meta pattern located at an outermost side may have a greatest thickness among the plurality of meta patterns.

The photoelectric conversion layer may include: a first photoelectric conversion layer belonging to a first sub-pixel; a second photoelectric conversion layer belonging to a second sub-pixel; and a third photoelectric conversion layer belonging to a third sub-pixel.

The meta pattern layer may include: a first meta pattern layer corresponding to the first photoelectric conversion layer and having a first height that causes the resonance to block transmission of a first wavelength of the incident light; a second meta pattern layer corresponding to the second photoelectric conversion layer and having a second height that causes the resonance to block transmission of a second wavelength of the incident light; and a third meta pattern layer corresponding to the third photoelectric conversion layer and having a third height that causes the resonance to block transmission of a third wavelength of the incident light.

The meta pattern layer may have a resonance wavelength (λ) at a center, represented by the following equation: λ=557.62×h 0.5642 (h is the height of the meta pattern layer), and the resonance may occur with respect to the given wavelength corresponding to the resonance wavelength at the center.

Each of the plurality of meta patterns may have a thickness that causes the resonance at a corresponding wavelength in a radial direction.

According to an aspect of an example embodiment, provided is an image sensor including: a photoelectric conversion layer; a plurality of base layers that are transparent and sequentially stacked on the photoelectric conversion layer; and a plurality of metasurfaces stacked on the photoelectric conversion layer, wherein the plurality of metasurfaces are arranged between the plurality of base layers, respectively; the plurality of metasurfaces include a plurality of meta patterns and have a same phase profile as that of a lens; the plurality of metasurfaces have dimensions that respectively cause a resonance at a given wavelength of incident light to block transmission of the given wavelength; and wavelengths that cause the resonance of the plurality of metasurfaces are different from each other.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects, features, and advantages of certain example embodiments of the disclosure will be more apparent from the following description taken in conjunction with the accompanying drawings, in which:

FIG. 1 is a cross-sectional view of a sub-pixel of an image sensor including a meta pattern layer having a light resonance function, according to an example embodiment;

FIG. 2 is a plan view of the meta pattern layer of FIG. 1 ;

FIG. 3 is a cross-sectional view taken along line 3 - 3 ′ in FIG. 2 ;

FIGS. 4 to 11 are cross-sectional views and plan views showing various examples of a meta pattern layer according to example embodiments;

FIG. 12 is a plan view showing an example in which a planar shape of a first unit meta pattern of FIG. 11 is circular;

FIG. 13 is a plan view showing an example in which a planar shape of the first unit meta pattern of FIG. 11 is a single-walled cylindrical shape;

FIG. 14 is a cross-sectional view taken along line 14 - 14 ′ of FIG. 11 ;

FIG. 15 is a plan view showing second unit meta patterns that may replace first unit meta patterns of FIG. 11 ;

FIG. 16 is a plan view showing an image sensor including a meta pattern layer having a light resonance function, according to an example embodiment;

FIGS. 17 A, 17 B, and 17 C show graphs and photos showing simulation results conducted to identify resonance characteristics of an image sensor including a meta pattern layer having a light resonance function according to an example embodiment; and

FIG. 18 is a plan view showing an image sensor including a meta pattern layer having a light resonance function according to an example embodiment.

DETAILED DESCRIPTION

Reference will now be made in detail to embodiments, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to like elements throughout. In this regard, example embodiments may have different forms and should not be construed as being limited to the descriptions set forth herein. Accordingly, the example embodiments are merely described below, by referring to the figures, to explain aspects. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items. Expressions such as “at least one of,” when preceding a list of elements, modify the entire list of elements and do not modify the individual elements of the list.

Hereinafter, an image sensor including a meta pattern layer having a light resonance function according to an example embodiment will be described in detail with reference to the accompanying drawings. A manufacturing method of the image sensor will be described together in the process of describing the layer structure. In this process, in the drawings, thicknesses of layers and regions may be exaggerated for clarity of specification. Also, the embodiments described below are merely illustrative, and are capable of various modifications. In the layer structure described below, when an element is referred to as being “on” or “above” another element, the element may be in direct contact with the other element or other intervening elements may be present. In the drawings, like reference numerals refer to the like elements.

FIG. 1 shows a sub-pixel of an image sensor including a meta pattern layer having a light resonance function according to an example embodiment.

Referring to FIG. 1 , a sub-pixel 100 may include a photoelectric conversion layer 110 , a transparent interlayer material layer 120 , and a multifunctional meta pattern layer 130 . In an example, the photoelectric conversion layer 110 may include a photoelectric conversion element for converting light incident through the meta pattern layer 130 and the interlayer material layer 120 to a current. In an example, the photoelectric conversion element may include a photodiode. In an example, the interlayer material layer 120 may include a material layer that is transparent to light incident through the meta pattern layer 130 and does not absorb or substantially does not absorb light. “Not substantially absorbing” means that a light absorption rate is 10% or less, for example, 5% or less. In an example, the material layer may include a siloxane-based spin on glass (SOG), a transparent polymer, and a silicon oxide (e.g., SiO 2 ). In an example, the material layer may be an air layer.

The meta pattern layer 130 may include a metasurface formed on the interlayer material layer 120 . The metasurface may include a plurality of meta patterns. The size of each meta pattern may be less than the wavelength of incident light. In an example, the size of each meta pattern may be ½ or less of the wavelength of incident light. The metasurface of the meta pattern layer 130 may be designed to have various functions. In an example, the meta pattern layer 130 may include a metasurface designed to perform as a metalens. This will be described in detail later. Because the meta pattern layer 130 serves as a metalens, light incident on the meta pattern layer 130 may be condensed onto the photoelectric conversion layer 110 . A thickness of the interlayer material layer 120 may vary depending on a focal length of the meta pattern layer 130 serving as a metalens. In an example, the meta pattern layer 130 may also cause resonance at a certain wavelength and block the certain wavelength, in addition to serving as a metalens. In other words, the metasurface included in the meta pattern layer 130 may be designed to cause a blocking resonance to a certain wavelength. Most of the light causing resonance among light incident on the meta pattern layer 130 may be scattered during resonance and some of the light may be absorbed. As a result, light causing resonance among light incident on the meta pattern layer 130 may not be transmitted through the meta pattern layer 130 and be blocked. In this regard, the resonance occurring in the meta pattern layer 130 may be regarded as a transmission blocking resonance.

In an example, the certain wavelength may belong to a visible light region, and the meta pattern layer 130 may serve as a color filter for filtering (blocking) a color of the certain wavelength in the visible light region. Therefore, in accordance with a form of the metasurface included in the meta pattern layer 130 , the unit sub-pixel 100 may be used as a sub-pixel for a first wavelength, a sub-pixel for a second wavelength, or a sub-pixel of a third wavelength of the visible light region. The first to third wavelengths may be different wavelengths from each other. In an example, among the first wavelength to the third wavelength, the first wavelength may correspond to cyan, the second wavelength may correspond to magenta, and the third wavelength may correspond to yellow.

FIG. 2 is a plan view of the meta pattern layer 130 of FIG. 1 .

Referring to FIG. 2 , the meta pattern layer 130 may include a metasurface 130 A and a low refractive index layer 1306 . The low refractive index layer 130 B may be transparent to light incident on the meta pattern layer 130 . A refractive index of the low refractive index layer 1306 may be less than that of a material forming the metasurface 130 A, that is, a meta material. The low refractive index layer 130 B may be arranged to completely surround the metasurface 130 A. In an example, the low refractive index layer 130 B may be an inorganic material layer, and may include, for example, a SOG or a silicon oxide. In an example, the low refractive index layer 130 B may be an air layer. The metasurface 130 A may include a plurality of meta patterns 2 A, 2 B, 2 C, and 2 D (hereinafter, also referred to as a first meta pattern 2 A, a second meta pattern 2 B, a third meta pattern 2 C, a fourth meta pattern 2 D, or remaining plurality of meta patterns 2 B, 2 C, and 2 D), but is not limited thereto. The plurality of meta patterns 2 A, 2 B, 2 C, and 2 D may be formed of an inorganic material having a high refractive index greater than the refractive index of the low refractive index layer 130 B. In an example, the inorganic material may include TiO 2 , SiN x , or GaP. The plurality of meta patterns 2 A, 2 B, 2 C, and 2 D may be separated from each other. In an example, the first meta pattern 2 A may be circular and have a first radius r1, but is not limited thereto. In an example, the first radius r1 may be about 50 nm to about 200 nm. The first meta pattern 2 A may be at a center of the metasurface 130 A. A center of the plurality of meta patterns 2 A, 2 B, 2 C, and 2 D may be a center of the first meta pattern 2 A. The remaining plurality of meta patterns 2 B, 2 C, and 2 D excluding the first meta pattern 2 A may be arranged to form a concentric circle around the first meta pattern 2 A. While it is illustrated that each of the plurality of meta patterns 2 A, 2 B, 2 C, and 2 D may be of a concentric circle, an embodiment is not limited thereto and the plurality of meta patterns 2 A, 2 B, 2 C, and 2 D may form a shape similar to the concentric circle (e.g., a concentric oval). The term “shape similar to the concentric circle” may refer to any shape that has a similarity to the concentric circle at a predetermined degree or greater (e.g., 80% or greater).

Because the plurality of meta patterns 2 A, 2 B, 2 C, and 2 D form such a shape, the metasurface 130 A may have the same phase profile as that of a lens, and as a result, the meta pattern layer 130 may serve as a metalens (e.g., a converging lens). As a result, light passed through the metasurface 130 A, that is, light passed through the meta pattern layer 130 , may be condensed onto the photoelectric conversion layer 110 in the focal length of the meta pattern layer 130 .

The second meta pattern 2 B may be provided to completely surround the first meta pattern 2 A. The second meta pattern 2 B may be provided in the shape of a ring having a second radius r2 as an inner diameter and a third radius r3 as an outer diameter, but is not limited thereto. In an example, when the shape of the first meta pattern 2 A is non-circular, the second meta pattern 2 B may have a ring shape resembling the first meta pattern 2 A. The second radius r2 of the second meta pattern 2 B may be greater than the first radius r1 of the first meta pattern 2 A. A difference r2−r1 between the second radius r2 and the first radius r1 may be a first separation distance between the first meta pattern 2 A and the second meta pattern 2 B. A difference r3−r2 between the third radius r3 and the second radius r2 of the second meta pattern 2 B may be a thickness of the second meta pattern 2 B in the radial direction thereof. A first thickness r3−r2 in the radial direction of the second meta pattern 2 B may be smaller than the first radius r1 of the first meta pattern 2 A. In an example, the first thickness r3−r2 in the radial direction of the second meta pattern 2 B and the first separation distance r2−r1 between the first meta pattern 2 A and the second meta pattern 2 B may be identical to or different from each other. For example, the first thickness r3−r2 of the second meta pattern 2 B may be greater or smaller than the first separation distance r2−r1 between the first and second meta patterns 2 A and 2 B. A third meta pattern 2 C may be disposed in a shape to completely surround the first meta pattern 2 A and the second meta pattern 2 B. In an example, the third meta pattern 2 C may have a ring shape having a fourth radius r4 as an inner diameter and a fifth radius r5 as an outer diameter. In an example, when the shape of the first meta pattern 2 A is non-circular, as in the second meta pattern 2 B, the third meta pattern 2 C may have a ring shape resembling the first meta pattern 2 A. The fourth radius r4 and the fifth radius r5 of the third meta pattern 2 C may be greater than the first to third radiuses r1, r2, and r3. The difference r4−r3 between the fourth radius r4 of the third meta pattern 2 C and the third radius r3 of the second meta pattern 2 B may be a second separation distance between the third meta pattern 2 C and the second meta pattern 2 B. The second separation distance r4−r3 and the first separation distance r2−r1 may be identical to or different from each other. In an example, the second separation distance r4−r3 may be greater or smaller than the first separation distance r2−r1. In an example, the second separation distance r4−r3 may be smaller than the first radius r1 of the first meta pattern 2 A. In an example, the second separation distance r4−r3 may be identical to or different from the first thickness r3−r2. A difference r5−r4 between the fifth radius r5 and the fourth radius r4 of the third meta pattern 2 C may be a thickness in the radial direction of the third meta pattern 2 C. In an example, a second thickness r5−r4 of the third meta pattern 2 C may be smaller than the first radius r1. In an example, the second thickness r5−r4 may be identical to or different from the first thickness r3-r2. In an example, the second thickness r5−r4 may be identical to or different from the second separation distance r4−r3. In an example, the second thickness r5−r4 may be identical to or different from the first separation distance r2−r1. The fourth meta pattern 2 D may be arranged to completely surround the first to third meta patterns 2 A to 2 C. The shape of the fourth meta pattern 2 D may be in the form of a ring having an inner diameter of a sixth radius r6 and an outer diameter of a seventh radius r7. A difference r6−r5 between the sixth radius r6 and the fifth radius r5 may be a third separation distance between the third meta pattern 2 C and the fourth meta pattern 2 D. The third separation distance r6−r5 may be greater than the first separation distance r2−r1 and the second separation distance r4−r3, and vice versa. In an example, the third separation distance r6−r5 may be or not be less than the first radius r1. In an example, the third separation distance r6−r5 may be greater than or not be greater than the first thickness r3−r2 and the second thickness r5−r4. In an example, the third separation distance r6−r5 may be less than at least one of the first thickness r3−r2 and the second thickness r5−r4. A difference r7−r6 between the seventh radius r7 and the sixth radius r6 of the fourth meta pattern 2 D may be a thickness in the radial direction of the fourth meta pattern 2 D. A third thickness r7−r6 of the fourth meta pattern 2 D may be greater than the first thickness r3−r2 and the second thickness r5−r4, and vice versa. In an example, the third thickness r7−r6 may be greater than or may not be greater than the first to third separation distances r2−r1, r4−r3, and r6−r5 For example, the third thickness r7−r6 may be less than at least one of the first to third separation distances r2−r1, r4−r3, and r6−r5.

Although the metasurface 130 A is illustrated to include four meta patterns 2 A, 2 B, 2 C, and 2 D, this is for convenience of explanation, and the metasurface 130 A may include four or more, or four meta patterns or less.

FIG. 3 shows a cross-sectional view taken along line 3 - 3 ′ of FIG. 2 .

Referring to FIG. 3 , the first meta pattern 2 A may have a first height h1 in a direction perpendicular to the upper surface of the interlayer material layer 120 . The first height h1 of the first meta pattern 2 A, which is highest at the center, may represent the height of the metasurface 130 A. The first height h1 may be identical to or different from the first radius r1. The second meta pattern 2 B may have a second height h2 in the same direction as the first height h1. The third meta pattern 2 C may have a third height h3 in the same direction as the first height h1. The fourth meta pattern 2 D may have a fourth height h4 in the same direction as the first height h1. In an example, the first to third heights h1, h2, and h3 may be the same from each other, but may not be the same from each other, as described below. In an example, the fourth height h4 may be less than or not be less than the first to third heights h1, h2, and h3. The height of the low refractive index layer 130 B may be the same as the height of the first to third meta patterns 2 A, 2 B, and 2 C. In the case of FIG. 3 , the height h1 of the first meta pattern 2 A, which is the highest among the meta patterns 2 A, 2 B, 2 C, and 2 D included in the metasurface 130 A, may be the same as the height h of the meta pattern layer 130 . When the height of the meta pattern layer 130 or the height of the metasurface 130 A decreases or increases to a certain amount, the height of each of the meta patterns 2 A, 2 B, 2 C, and 2 D included in the metasurface 130 A may also decrease or increase in the same proportion. The same applies to other dimensions (e.g., separation distance, thickness, etc.) of each of the meta patterns 2 A, 2 B, 2 C, and 2 D. Thus, the meta patterns 2 A, 2 B, 2 C, and 2 D may be reduced or increased at a same rate.

Due to the planar shape of the metasurface 130 A, the meta pattern layer 130 may have a lens function. In addition, according to the dimensions of each of the meta patterns 2 A, 2 B, 2 C, and 2 D, light of a certain wavelength band of a narrow region incident on the metasurface 130 A may cause resonance. In other words, when the dimensions of each of the meta patterns 2 A, 2 B, 2 C, and 2 D satisfy a resonance condition of light of a certain narrow wavelength band, light of a certain wavelength in the metasurface 130 A may resonate. During resonance, a majority portion of the light of a certain wavelength is scattered, and another portion of the light of the certain wavelength may be absorbed in the meta pattern layer 130 . Due to such resonance, light of the certain wavelength passing through the meta pattern layer 130 may be substantially blocked or restricted.

The resonance occurring in the meta pattern layer 130 may be represented by Equation 1. λ=557.62× h 0.5642 <Equation 1>

In Equation 1, Δ (nm) represents a resonance wavelength at the center and h (μm) represents the height of the meta pattern layer 130 .

Therefore, when light incident on the meta pattern layer 130 satisfies Equation 1, that is, when the wavelength of light incident on the meta pattern layer 130 corresponds to the resonance wavelength λ at the center, transmission blocking resonance may occur in the meta pattern layer 130 . “When the wavelength of light corresponds to the resonance wavelength λ at the center” may refer not only to a case where the wavelength of light incident on the meta pattern layer 130 is identical to the resonance wavelength λ at the center, but also to a case where the wavelength of incident light is adjacent to the resonance wavelength at the center, thus being in a wavelength band (hereinafter referred to as resonance band) that may cause resonance. The resonance wavelength at the center may be a wavelength at the center of the resonance band. In the resonance band, the resonance may become weaker as the distance from the resonance wavelength at the center becomes greater.

As described below, designs of the meta pattern layer 130 may vary according to embodiments. Thus, dimensions (e.g., distance, height, etc.) related to the diameters of the meta patterns 2 A, 2 B, 2 C and 2 D included in the meta pattern layer 130 may change. Therefore, the resonance wavelength at the center of Equation 1 may change according to the design of the meta pattern layer 130 .

The resonance may include, for example, a Mie resonance or a Fano resonance.

As a result, by adjusting or appropriately selecting the dimension of the plurality of meta patterns 2 A, 2 B, 2 C, and 2 D, light component (e.g., wavelength) that passes through the meta pattern layer 130 or light component (e.g., wavelength) that does not pass through the meta pattern layer 130 may be sorted out or selected from light incident on the meta pattern layer 130 .

The expressions, “blocking” and “passing” of light may be relative. In an embodiment, although “blocking” may refer to a case where light does not pass 100% through a media, a light component having an intensity that is less than or equal to a predetermined intensity relative to a light component having a maximum intensity, among the light components that passed through the media, may also be regarded as being blocked. “Passing” may refer not only to a case where light passes 100% through a media, but also to a case where the intensity of light that passed through the media is greater than or equal to the determined intensity.

The meta pattern layer 130 may be modified in various ways. In an embodiment, when the meta pattern layer 130 described above is the first meta pattern layer 130 , FIG. 4 shows a second meta pattern layer 400 . Only parts that are different from those of the first meta pattern layer 130 will be described. Hereinafter, the same applies to descriptions regarding other meta pattern layers.

Referring to FIG. 4 , heights h1 to h4 of the meta patterns 2 A, 2 B, 2 C, and 2 D may be smaller than a height h5 of the low refractive index layer 130 B. Thus, the low refractive index layer 130 B may completely cover the metasurface 130 A. The first to fourth meta patterns 2 A, 2 B, 2 C, and 2 D may be covered by the low refractive index layer 130 B, and the low refractive index layer 130 B may fill regions between the first to fourth meta patterns 2 A, 2 B, 2 C, and 2 D. Therefore, the heights h1 to h4 of the first to fourth meta patterns 2 A, 2 B, 2 C, and 2 D may be smaller than the height h5 of the low refractive index layer 130 B, and the upper surface of the first to fourth meta patterns 2 A, 2 B, 2 C, and 2 D may be below and separated from an upper surface 130 S of the low refractive index layer 130 B.

FIG. 5 shows a third meta pattern layer 500 according to an example embodiment.

Referring to FIG. 5 , in the third meta pattern layer 500 , the heights of the second and third meta patterns 2 B and 2 C may be smaller than the height of the first meta pattern 2 A and greater than the height of the fourth meta pattern 2 D. Thus, the heights of the second and third meta patterns 2 B and 2 C may be between the heights of the first and fourth meta patterns 2 A and 2 D. Also, the heights of the first meta pattern 2 A and the low refractive index layer 130 B may be the same, and the heights of the second to fourth meta patterns 2 B, 2 C, and 2 D may be smaller than the height of the low refractive index layer 130 B.

FIG. 6 shows a fourth meta pattern layer 600 according to an example embodiment.

Referring to FIG. 6 , in the fourth meta pattern layer 600 , the heights of the second and third meta patterns 2 B and 2 C may be the same as the height of the low refractive index layer 130 B. The heights of the first and fourth meta patterns 2 A and 2 D may be different from each other and may be smaller than the heights of the second and third meta patterns 2 B and 2 C. The upper surface of the first meta pattern 2 A may be lower than and separated from the upper surface of the low refractive index layer 130 B. The height of the first meta pattern 2 A may be greater than the height of the fourth meta pattern 2 D.

FIG. 7 shows a fifth meta pattern layer 700 according to an example embodiment.

Referring to FIG. 7 , in the fifth meta pattern layer 700 , thicknesses t1 and t2 in the x-axis direction of the second and third meta patterns 2 B and 2 C may be different from each other and may be smaller than the thicknesses of the first and fourth meta patterns 2 A and 2 D. In an embodiment, the thickness t1 of the second meta pattern 2 B may be greater than the thickness t2 of the third meta pattern 2 C, or vice versa. The thickness t2 of the third meta pattern 2 C may be a value between the thickness t1 of the second meta pattern 2 B and the thickness of the fourth meta pattern 2 D.

FIG. 8 shows a sixth meta pattern layer 800 according to an example embodiment.

Referring to FIG. 8 , in the sixth meta pattern layer 800 , distances among the first to fourth meta patterns 2 A to 2 D may be different from each other. In an embodiment, a first distance d1 between the first meta pattern 2 A and the second meta pattern 2 B may be less than a second distance d2 between the second meta pattern 2 B and the third meta pattern 2 C. In an embodiment, the second distance d2 may be less than a third distance d3 between the third meta pattern 2 C and the fourth meta pattern 2 D. Thus, the distances among the first to fourth meta patterns 2 A, 2 B, 2 C, and 2 D may increase in an x-axis direction from the first meta pattern 2 A to the fourth meta pattern 2 D. However, this is merely an example and the first to fourth meta patterns 2 A, 2 B, 2 C, and 2 D may be arranged in an opposite way (that is, the distances may decrease in an x-axis direction from the first meta pattern 2 A to the fourth meta pattern 2 D).

FIG. 9 shows a seventh meta pattern layer 900 according to an example embodiment.

As shown in FIG. 9 , in the seventh meta pattern layer 900 , heights of the first and fourth meta patterns 2 A and 2 D may be the same as the height h5 of the low refractive index layer 130 B, and the upper surface of the first and fourth meta patterns 2 A and 2 D may not be covered by the low refractive index layer 130 B and be exposed. The heights of the second and third meta patterns 2 B and 2 C may be less than those of the first and fourth meta patterns 2 A and 2 D and covered by the low refractive index layer 130 B.

FIG. 10 shows an eighth meta pattern layer 1000 according to an example embodiment.

As shown in FIG. 10 , in the eighth meta pattern layer 1000 , the heights of the first and second meta patterns 2 A and 2 B may be the same as a height h5 of the upper surface 130 S of the low refractive index layer 130 B, and thus, may not be covered by the low refractive index layer 130 B and be exposed. The height of the third meta pattern 2 C may be less than that of the second meta pattern 2 B and greater than that of the fourth meta pattern 2 D. The height of the meta patterns may decrease from the second meta pattern 2 B to the fourth meta pattern 2 D. In other words, the heights of the meta patterns 2 B, 2 C, and 2 D included in the metasurface 130 A may decrease from the center to the periphery.

FIG. 11 shows a ninth meta pattern layer 1100 included in an image sensor according to an example embodiment.

Referring to FIG. 11 , the ninth meta pattern layer 1100 may have an array shape in which a first meta pattern group MG 1 is at the center and second and third meta pattern groups MG 2 and MG 3 are distributed around the first meta pattern group MG 1 . In an example, the ninth meta pattern layer 1100 may include an array of 10 rows and 10 columns (10*10), but is not limited thereto, and may include an array of 3*3 or any other n*n array (n being an integer greater than 2). Each of the meta pattern groups MG 1 to MG 3 may include a plurality of first unit meta patterns 130 D. The planar shape of one first unit meta pattern 130 D may be rectangular and may be in other forms as illustrated in FIGS. 12 , 13 , and 15 , but is not limited thereto. In an example, one first unit meta pattern 130 D may be a nanorod. The second and third meta pattern groups MG 2 and MG 3 may be arranged to sequentially surround the first meta pattern group MG 1 . In an example, the first meta pattern group MG 1 may include four first unit meta patterns 130 D, but is not limited thereto, and the first meta pattern group MG 1 may include a plurality of first unit meta patterns 130 D less than or greater than four. The second meta pattern group MG 2 surrounds the first meta pattern group MG 1 , but a first portion of the plurality of first unit meta patterns 130 D included in the second meta pattern group MG 2 may contact the first meta pattern group MG 1 in a diagonal direction, and a second portion of the plurality of first unit meta patterns 130 D included in the second meta pattern group MG 2 may be arranged to be separated from the first meta pattern group MG 1 by a first distance D 11 . Regarding the second meta pattern group MG 2 , the first unit meta patterns 130 D may be arranged at a location facing the first meta pattern group MG 1 in an x-axis and z-axis direction in the same number as the meta unit patterns 130 D of the first meta pattern group MG 1 . In the second meta pattern group MG 2 , one first unit meta pattern 130 D is arranged in contact with the first meta pattern group MG 1 in each diagonal direction of the first meta pattern group MG 1 . Therefore, when the first meta pattern group MG 1 includes four first unit meta patterns, the second meta pattern group MG 2 may include twelve first unit meta patterns 130 D. The third meta pattern group MG 3 may be arranged to completely surround the first and second meta pattern groups MG 1 and MG 2 . The third meta pattern group MG 3 may be separated from the second meta pattern group MG 2 . The first unit meta patterns arranged in the x-axis and z-axis direction among the first unit meta patterns 130 D included in the third meta pattern group MG 3 may be separated from the first unit meta patterns in the x-axis and z-axis direction of the second meta pattern group MG 2 by a second distance D 12 . The third meta pattern group MG 3 may include a total of six first unit meta patterns 130 D, three in each direction, for both directions of a first diagonal direction of the first meta pattern group MG 1 , and may also include six first unit meta patterns 130 D for a second diagonal direction perpendicular to the first diagonal direction of the first meta pattern group MG 1 .

In FIG. 11 , row lines RL 1 and column lines CL 1 are employed to explain array forms of each of meta pattern group, and are not actually included in the meta pattern layer 1100 .

Due to the planar shape of the first to third meta pattern groups MG 1 to MG 3 illustrated in FIG. 11 , light passed through the ninth meta pattern layer 1100 may have the same phase profile as when passing through a lens (e.g., a converging lens) or a similar phase profile to the phase profile as when passing through a lens. Thus, the ninth meta pattern layer 1100 may serve as a metalens. Further, by adjusting first and second distances D 11 and D 12 between the first to third meta pattern groups MG 1 to MG 3 and/or the shape and dimension, etc. of the first unit meta patterns 130 D while maintaining the overall shape of the ninth meta pattern layer 1100 , resonance to a certain wavelength of light incident on the ninth meta pattern layer 1100 may occur in the ninth meta pattern layer 1100 . Therefore, by setting the dimensions regarding the first to third meta pattern groups MG 1 to MG 3 to satisfy a resonance condition of a certain wavelength, transmission or blocking of certain components (e.g., cyan, magenta, yellow) among components (e.g., wavelengths) included in light incident on the ninth meta pattern layer 1100 may be determined.

FIG. 12 shows an example in which a planar shape of the first unit meta pattern 130 D of FIG. 11 is circular.

FIG. 13 shows an example in which a planar shape of the first unit meta pattern 130 D of FIG. 11 is a single-walled cylindrical shape. However, an embodiment is not limited thereto and the planar shape of the first unit meta pattern 130 D of FIG. 11 may be a double-walled cylindrical shape.

FIG. 14 shows a cross-sectional view taken along line 14 - 14 ′ of FIG. 11 .

Referring to FIG. 14 , the low refractive index layer 130 B may fill regions between the first unit meta patterns 130 D of the first to third meta pattern groups MG 1 , MG 2 , and MG 3 . In an example, the height of the first unit meta pattern 130 D may be the same as the height of the low refractive index layer 1308 , but is not limited thereto. In an example, the low refractive index layer 130 B may be arranged to completely cover the first unit meta pattern 130 D while filling regions between the first unit meta patterns 130 D. The first and second meta pattern groups MG 1 and MG 2 are separated by the first distance D 11 in the x-axis direction, and the second and third meta pattern groups MG 2 and MG 3 are separated by the second distance D 12 in the x-axis direction. The first and second distances D 11 and D 12 may be the same as or different from each other. In an example, the first and second distances D 11 and D 12 may be less than the wavelength of the incident light. In the first to third meta pattern groups MG 1 to MG 3 , the height of the first unit meta patterns 130 D may be the same, but may also differ according to each of the meta pattern groups MG 1 to MG 3 . In an example, the height of the first unit meta patterns 130 D included in the first and second meta pattern groups MG 1 and MG 2 may be different from each other, and the height of the first unit meta patterns 130 D included in the second and third meta pattern groups MG 2 and MG 3 may be the same as each other. In addition, there may be other variety of combinations.

FIG. 15 shows second unit meta patterns 130 E that may replace the first unit meta patterns 130 D of FIG. 11 .

Referring to FIG. 15 , the second unit meta pattern 130 E may include first and second cylinders 14 R 1 and 14 R 2 of a concentric circle. The second cylinder 14 R 2 is arranged to completely surround the first cylinder 14 R 1 . A diameter and a thickness of the first cylinder 14 R 1 , a distance between the first cylinder 14 R 1 and the second cylinder 14 R 2 , and a thickness of the second cylinder 14 R 2 may be adjusted during a manufacturing process.

FIG. 16 shows an image sensor 1600 including a metalens layer having a light resonance function according to an example embodiment. In an example, the image sensor 1600 may include a cyan magenta yellow (CMY) image sensor.

Referring to FIG. 16 , the image sensor 1600 may include a photoelectric conversion layer 1620 , a transparent interlayer material layer 1640 , and a meta pattern layer 1660 . The photoelectric conversion layer 1620 , the interlayer material layer 1640 , and the meta pattern layer 1660 may be sequentially stacked. The photoelectric conversion layer 1620 may include a first photoelectric conversion layer LE 1 belonging to a first sub-pixel SP 1 , a second photoelectric conversion layer LE 2 belonging to a second sub-pixel SP 2 , and a third photoelectric conversion layer LE 3 belonging to a third sub-pixel SP 3 . The interlayer material layer 1640 may include a first transparent material layer 16 M 1 belonging to the first sub-pixel SP 1 , a second transparent material layer 16 M 2 belonging to the second sub-pixel SP 2 , and a third transparent material layer 16 M 3 belonging to the third sub-pixel SP 3 . The meta pattern layer 1660 may include a first meta pattern layer MP 1 belonging to the first sub-pixel SP 1 , a second meta pattern layer MP 2 belonging to the second sub-pixel SP 2 , and a third meta pattern layer MP 3 belonging to the third sub-pixel SP 3 . The meta pattern layer 1660 may include a low refractive index layer 1680 covering a portion of the first to third meta pattern layers MP 1 , MP 2 , and MP 3 . The low refractive index layer 1680 may include the same material as the low refractive index layer 130 B described in FIGS. 2 and 3 . In the photoelectric conversion layer 1620 and the interlayer material layer 1640 , a vertical first separating layer 16 P 1 is provided between the first and second sub-pixels SP 1 and SP 2 to prevent interference of light between sub-pixels, and a vertical second separating layer 16 P 2 is provided between the second and third sub-pixels SP 2 and SP 3 to prevent interference of light between sub-pixels. In an example, the first to third photoelectric conversion layers LE 1 , LE 2 , and LE 3 may include the photoelectric conversion layer 110 of FIG. 1 . In an example, the first to third transparent material layers 16 M 1 , 16 M 2 , and 16 M 3 may be the same material layer as each other, and may include the interlayer material layer 120 of FIG. 1 . The first to third meta pattern layers MP 1 , MP 2 , and MP 3 may have first to third heights MH 1 , MH 2 , and MH 3 , respectively. Each of the first to third meta pattern layers MP 1 , MP 2 , and MP 3 may include the meta pattern layer 130 described in FIGS. 1 to 15 . Here, the first meta pattern layer MP 1 may include the meta pattern layer 130 configured to have a first resonance characteristic causing resonance at the first wavelength (e.g., cyan), the second meta pattern layer MP 2 may include the meta pattern layer 130 configured to have a second resonance characteristic causing resonance at the second wavelength (e.g., magenta), and the third meta pattern layer MP 3 may include the meta pattern layer 130 configured to have a third resonance characteristic causing resonance at the third wavelength (e.g., yellow). In an example, the first to third wavelengths may be wavelengths in the visible light region, but are not limited thereto. The first to third resonance characteristics may be different from each other, and to this end, the heights MH 1 to MH 3 of the first to third meta pattern layers MP 1 to MP 3 may be different from each other. Because such meta pattern layer 1660 is provided, in the image sensor 1600 , light of the first wavelength among incident light L 11 may be blocked in the first sub-pixel SP 1 , light of the second wavelength among incident light L 11 may be blocked in the second sub-pixel SP 2 , and light of the third wavelength among incident light L 11 may be blocked in the third sub-pixel SP 3 . The first to third wavelengths may be different from each other. As a result, each of the sub-pixels SP 1 to SP 3 may have different transmission spectra from each other. Thus, color filtering may be achieved in each of the sub-pixels SP 1 to SP 3 . Light 16 L 1 passed through the first meta pattern layer MP 1 may be condensed onto the first photoelectric conversion layer LE 1 via the first transparent material layer 16 M 1 . Light 16 L 2 passed through the second meta pattern layer MP 2 may be condensed onto the second photoelectric conversion layer LE 2 via the second transparent material layer 16 M 2 . Light 16 L 3 passed through the third meta pattern layer MP 3 may be condensed onto the third photoelectric conversion layer LE 3 via the third transparent material layer 16 M 3 .

FIGS. 17 A, 17 B, and 17 C show simulation results conducted to identify resonance characteristics of an image sensor including a metalens layer having a resonance function according to an example embodiment.

The image sensor used in the simulation includes a metalens layer designed to have a third height that causes resonance at a wavelength of 600 nm.

FIG. 17 A is a graph showing the simulation result. In FIG. 17 A , the horizontal axis represents the wavelength, and the vertical axis represents the transmittance. In FIG. 17 A , a first graph 17 G 1 represents an actually measured cyan spectrum, a second graph 17 G 2 represents a predicted magenta spectrum, and a third graph 17 G 3 represents a predicted yellow spectrum.

Referring to the first graph 17 G 1 , the transmittance is greatly reduced only at a wavelength of 600 nm. This result is due to the metalens layer designed to cause resonance at 600 nm. From this result, when the metalens layer is designed to have a second height and a first height respectively causing resonance in the middle wavelength band and short wavelength band of visible light, magenta and yellow spectrum may be obtained as illustrated in the second and third graphs 17 G 2 and 17 G 3 . The height of the metalens layer may be increased in the order of the first height, the second height, and the third height. The first to third graphs 17 G 1 to 17 G 3 suggest that when the height of the metalens layer increases, the resonance wavelength also increases.

FIG. 17 B shows that when light (e.g., light having a wavelength of 540 nm) in a region where resonance does not occur in the first graph 17 G 1 of FIG. 17 A is incident on the image sensor, light reaches the photoelectric conversion layer (e.g., photodiode) 17 P. The light portion 17 B of the photoelectric conversion layer 17 P represents light reached at the photoelectric conversion layer 17 P.

FIG. 17 C shows that when light (e.g., light having a wavelength of 600 nm) in a region where resonance occurs in the first graph 17 G 1 of FIG. 17 A is incident on the image sensor, light does not reach the photoelectric conversion layer 17 P due to the resonance that occurs at the wavelength of 600 nm.

FIG. 18 shows a second image sensor 1800 including a metalens layer having a light resonance function according to an example embodiment. In an example, the second image sensor 1800 may be a hyperspectral image sensor.

Referring to FIG. 18 , the second image sensor 1800 may include a photoelectric conversion layer 1810 and a first base layer 1861 , a first meta pattern layer 18 M 1 , a second base layer 18 E 32 , a second meta pattern layer 18 M 2 , a third base layer 18 E 33 , and a third meta pattern layer 18 M 3 sequentially stacked on the photoelectric conversion layer 1810 . A plurality of base layers and a plurality of meta pattern layers may be further provided on the third meta pattern layer 18 M 3 .

The first to third base layers 18 B 1 to 18 B 3 may include a transparent material layer that does not absorb or does not substantially absorb incident light. In an example, the first to third base layers 18 B 1 to 18 B 3 may be the interlayer material layer 120 of FIG. 1 or may include the interlayer material layer 120 . The first to third meta pattern layers 18 M 1 to 18 M 3 may each include the meta pattern layer and the metasurface described in any of FIGS. 2 to 15 . In this case, each of the meta pattern layers 18 M 1 to 18 M 3 may be configured to have different resonance characteristics from each other. In an example, the first meta pattern layer 18 M 1 may be configured to show a first resonance characteristic causing resonance to light having a first wavelength, the second meta pattern layer 18 M 2 may be configured to show a second resonance characteristic causing resonance to light having a second wavelength, and the third meta pattern layer 18 M 3 may be configured to show a third resonance characteristic causing resonance to light having a third wavelength. In an example, the first to third wavelengths may be a wavelength of a red region, a green region, and a blue region, respectively. In an example, the first to third wavelengths may be different wavelengths in any one of the red region, green region, and blue region.

An image sensor according to example embodiments may include a single meta pattern layer that simultaneously performs light collecting and color filtering functions. The metasurface included in the meta pattern layer may be an inorganic material. Therefore, thermal and/or chemical stability problems due to the use of organic materials in color filters of image sensors of the related art may be improved or solved. Further, because one single-layered metasurface replaces a microlens layer and a color filter layer, a unit image sensor may be miniaturized, and as a result, a degree of integration of an image sensor chip may be increased.

It should be understood that example embodiments described herein should be considered in a descriptive sense only and not for purposes of limitation. Descriptions of features or aspects within each embodiment should typically be considered as available for other similar features or aspects in other embodiments. While one or more embodiments have been described with reference to the figures, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope as defined by the following claims and their equivalents.